Joint symposium on nanofabrication and nanoengineering 2018
We would like to invite you to the joint symposium on nanofabrication and nanoengineering 2018, organized by Raith Nanofabrication, Heidelberg Instruments, SwissLitho AG, and the Department of Electrical & Computer Engineering of the National University of Singapore (NUS-ECE E6NanoFab). Topics covered will be Direct Write, Optical, Ion and Electron Beam Lithography.
Date: June 22nd, 2018; 0830 - 1300 hrs
Venue: EA-02-11, Blk EA,
9 Engineering Drive
Registration fee: Admission is free but is limited to registered participants only
Please register on or before 15th June 2018