Joint symposium on nanofabrication and nanoengineering 2018

We would like to invite you to the joint symposium on nanofabrication and nanoengineering 2018, organized by Raith Nanofabrication, Heidelberg Instruments, SwissLitho AG, and the Department of Electrical & Computer Engineering of the National University of Singapore (NUS-ECE E6NanoFab). Topics covered will be Direct Write, Optical, Ion and Electron Beam Lithography.

Date: June 22nd, 2018; 0830 - 1300 hrs

Venue: EA-02-11, Blk EA,

            9 Engineering Drive

            NUS, S117575

Registration fee: Admission is free but is limited to registered participants only

Please register on or before 15th June 2018

Click here to download the invitation flyer

Click here to register (form by Microsoft Forms will open in a new window)