Lithography-Symposium in Delft

We would like to invite you to the first Symposium on Direct Write, Optical, Ion and Electron Beam Lithography at the TU Delft, the Netherlands.

The symposium features technical experts from Heidelberg Instruments, Nanoscribe, ZEISS, micro resist technology, and Raith: Presentations will cover a wide spectrum of latest, state-of-the-art direct-write capabilities and advanced materials.

TU Delft and Kavli Nanolab Delft make modern nanofabrication capabilities available to the community; we also welcome researchers from industry and other universities.

Don‘t miss the opportunity to get a broad overview of different aspects of direct write lithography and to meet experts in all sorts of micro- and nanolithography disciplines.

Date: May 16th, 2018; 9 am - 5 pm

Venue: Kavli Nanolab Delft
            Lorentzweg 1, 2628 CJ Delft
            The Netherlands

Registration fee: Participation is free for registered participants

Deadline for registration: April 30th, 2018

Click here to download the invitation flyer

Click here to register on the Raith website