Lithography Systems for special substrates
Our standard lithography systems can accommodate substrates of arbitrary shapes with lateral dimensions of up to 1400 x 1400 mm2. Larger substrates require specially designed systems, in which the substrate is stationary and the exposure unit is moved during the writing process. We have designed and installed these types of systems for fabrication of linear encoders with dimensions of 3100 x 50 mm2 and for large area photomask production with an area up to 2400 x 1900 mm2 - the latter system is also equipped with a fully automatic handling system.
Besides lateral dimensions, substrates also differ in thickness and material properties. Our standard systems can handle all common semiconductor materials. We have developed special chuck and loader designs for very thin flexible substrates for sizes up to 1400 x 1400 mm2.
Some applications require exposures on existing structures with varying height, e.g. in deep etched groves. Heidelberg Instruments offers a special writing strategy for such applications.
For more information please contact your local sales office.