Prestigious Chinese Institute selects Heidelberg Instruments to support its micro and nano technology research

Heidelberg, Germany, June 10, 2013: Heidelberg Instruments GmbH announced the sale of an advanced DWL 66+ laser lithography system to Shanghai Institute of Microsystem And Information Technology (SIMIT), Chinese Academy of Sciences.

The DWL 66+ laser lithography system is an economical, high-resolution pattern generator for low volume mask making and direct writing. The capabilities and flexibility of this system make it the ultimate lithographic research tool in MEMS, BioMEMS, Micro Optics, ASICs, Micro Fluidics, Sensors, CGHs, and all other applications that require microstructures. The DWL 66+ is capable of binary and gray scale exposure, layer to layer alignment, and is able to produce sub micron features.

About Heidelberg Instruments, GmbH:  With an installation base in over 40 countries, Heidelberg Instruments is a world leader in production of high precision maskless lithography systems.  These systems are used for direct writing and photomask production by some of the most prestigious universities and industry leaders in the areas of MEMS, BioMEMS, Nano Technology, ASICS, TFT, Plasma Displays, Micro Optics, and many other related applications.

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