Northwestern University - NUFAB chooses a μPG 501 for micro scale patterning to support their research

Heidelberg, Germany, May 23, 2014: Heidelberg Instruments announces the sale of a MicroPG501 maskless optical lithography system to Northwestern University’s NUFAB. 

The μPG 501 is a micro pattern generator for direct writing applications and low volume mask making, designed with the focus on high performance low cost of operation. The system can be used for applications such as MEMS, Bio MEMS, Integrated Optics, Micro Fluidics or any other application that require high precision, high-resolution microstructures.

About the NUFAB advanced micro/nano fabrication research facility.

NUFAB is an advanced micro/nano fabrication research facility at Northwestern University. It provides resources for research in MEMs/NEMs, nano-bio, nano/microelectronics, and other related and interdisciplinary areas to Northwestern University community and outside researchers. It has recently moved to a new 6000 sq ft state-of-the-art cleanroom.
web: http://nufab.northwestern.edu

About Heidelberg Instruments GmbH:  With an installation base in over 40 countries, Heidelberg Instruments is a world leader in production of high precision maskless lithography systems.  These systems are used for direct writing and photomask production by some of the most prestigious universities and industry leaders in the areas of MEMS, BioMEMS, Nano Technology, ASICS, TFT, Plasma Displays, Micro Optics, and many other related applications.

 

Heidelberg Instruments GmbH

Email:  info@himt.de

Phone:  +49 6221 3430 0

www.himt.de

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