Presentations by Heidelberg Instruments at Stanford lithography symposium
Heidelberg, Germany, July 21, 2017: Following last year’s event held with Raith nanofabrication, Heidelberg Instruments was one of five companies to participate in the Symposium on Direct Write, Optical, Ion and Electron Beam Lithography hosted by the Stanford Nanofabrication Facility (SNF) at Stanford University on July 14th.
The Event was opened with a warm welcome by Prof. Roger Howe who gave an introduction and updates on the Stanford Nanofabrication Facility as well as the ExFAB, part of the SNF.
Talks contributed by Heidelberg Instruments were on the topics of "Write strategies for optical direct write technology" by Niels Wijnaendts and "High precision and high resolution: Requirements and solutions for high-end optical lithography applications" by Steffen Diez.
Other talks presented by Raith Nanofabrication, Zeiss, Nanoscribe, and Alveole discussed topics around the latest state-of-the-art direct write systems and their applications.
Attendees of the symposium included 120+ students, professors, researchers, and industry professionals representing over 30 universities, government laboratories, research institutes, and companies nationwide.
Niels Wijnaendts van Resandt, one of the speakers at the symposium and Heidelberg Instruments Director of Sales for North America, states:
“We really enjoy the direct communication with users of the Stanford Nanofabrication facility and experts from the community. Some really interesting and valuable connections were made.“
About Stanford Nanofabrication Facility: The SNF hosts a multi-user laboratory providing a state-of-the-art fabrication infrastructure. With its 10,000 sq ft cleanroom, the SNF is an open-use resource, which helps academic, industrial, and governmental researchers from around the globe achieve their scientific research goals in areas of optical devices, new semiconductor materials, MEMs/NEMS and many other applications.
About Heidelberg Instruments, GmbH: With an installation base of over 750 systems in more than 50 countries, Heidelberg Instruments Mikrotechnik GmbH is a world leader in the production of high-precision laser and maskless lithography systems. Due to their flexibility, power and versatility, these systems are employed for direct writing and photomask production in a wide range of settings and applications in research, development, and industry. Customers include some of the most prestigious universities and industry leaders in the areas of MEMS, BioMEMS, nanotechnology, ASICS, TFT, displays, micro optics, and many other related applications.