Heidelberg Instruments Holds Multiple Photolithography Workshops for Nanofabrication Researchers in the Chicago Area.
Heidelberg, Germany, February 12, 2018
Representatives from Heidelberg Instruments held three new workshops on their Maskless Aligner technology from January 24th through 26th of 2018. The one-day workshops each included roughly 15 participants from both academia and government and were hosted at various micro/nano fabrication facility locations throughout the Chicago area.
The photolithography workshops titled, “Maskless Photolithography with the Heidelberg Instruments MLA150”, were led by Steffen Diez, Chief Sales Officer at Heidelberg Instruments Mikrotechnik GmbH, Niels Wijnaendts van Resandt, Director of Sales for North and South America at Heidelberg Instruments Inc. as well as Christian Bach, CEO of Heidelberg Instruments Inc.
The first workshop on January 24th was hosted at the NUFAB, the central Micro/Nano Fabrication Facility at Northwestern University, providing a wide range of nanofabrication equipment and technical expertise to the users from the university as well as other academic and industrial researchers. The purpose of this workshop was to present features and capabilities of the MLA150 Maskless Aligner which was recently ordered and is soon to be installed at the NUFAB.
The following two workshops on January 25th and 26th were each held at the Center for Nanoscale Materials (CNM) – a U.S. Department of Energy Office of Science user facility located at Argonne National Laboratory and at the Pritzker Nanofabrication Facility (PNF) at the University of Chicago. Both facilities are currently working with a Heidelberg MLA150. The workshops addressed new features to the MLA150 Maskless Aligner, including the addition of a high resolution mode capable of a minimum structure size of 500 nm, speed enhancement by writing strategy optimization, advanced alignment option as well as several enhancements to simplify the daily system operation.
Niels Wijnaendts van Resandt, Heidelberg Instruments Director of Sales for North America, states:
“These workshops are an invaluable resource to retrieve feedback about our systems from the end users and an excellent opportunity to hear about the many different applications our Maskless Aligners are used for. We will be looking forward to continuing in this collaborative way with our customers in the years to come.”
Further highlights of both meetings were insights into innovations and technologies for the future, including the outlook for a new product development suited for production environments: The MLA300 system, an industrial version of the Maskless Aligner for 300mmx300mm substrates.
Apart from tackling technical concepts of the MLA technology and presenting new features, all three workshops provided an environment for in-depth discussions among the attendees and Heidelberg Instruments representatives. Researchers from various disciplines shared their positive feedback and thoughts on the MLA150 system, labeling it as their most popular tool for a wide array of different lithography applications.
About Heidelberg Instruments: With an installation base of over 800 systems in more than 50 countries, Heidelberg Instruments Mikrotechnik GmbH is a world leader in production of high-precision laser and maskless lithography systems. Some of the most prestigious universities and industry leaders use these powerful and flexible systems: in research, development and industrial applications for direct writing and photomask production. Heidelberg Instruments laser lithography systems are employed in the areas of MEMS, BioMEMS, nanotechnology, ASICS, TFT, displays, micro optics, and many other related applications.
Heidelberg Instruments GmbH