Heidelberg Instruments GmbH announced another order for a large area lithography capital equipment
Heidelberg, Germany, December 22, 2016: Heidelberg Instruments, a leader in design, development and production of laser lithography and Maskless Aligner Systems, announced order for another advanced VPG+1400 laser lithography system from a photomask production group in Asia.
The VPG+1400 utilizes the latest innovations in software, electronics and optics, including a newly and custom designed spatial light modulator powering an unmatched exposure speed with excellent image quality specifications required for advanced large area photomaks. It can pattern sub-micron structures (with an address grid down to 12 nm) on up to 1.4 by 1.5 meter substrates.
About Heidelberg Instruments, GmbH: With an installation base of over 750 systems in more than 50 countries, Heidelberg Instruments Mikrotechnik GmbH is a world leader in production of high precision laser and maskless lithography systems. Due to their flexibility, these systems are used in research, development and industrial applications for direct writing and photomask production by some of the most prestigious universities and industry leaders in the areas of MEMS, BioMEMS, Nano Technology, ASICS, TFT, Displays, Micro Optics, and many other related applications.
Heidelberg Instruments GmbH
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