Heidelberg Instruments announces the installation of a DWL 2000 at Carl Zeiss Jena GmbH, Germany

Heidelberg, Germany, February 22, 2012:  Heidelberg Instruments announces the installation of a DWL 2000 at Carl Zeiss Jena GmbH, Germany.

The DWL 2000 is a fast and flexible, high resolution pattern generator for mask making and direct writing of 2D and 3D micro structures. The system will be used for the production of state of the art micro optical components. With its advanced gray scale capabilities it can write arbitrary surface profiles and create highly complex optical elements with low surface roughness.

Carl Zeiss Jena GmbH is widely established company with facilities in Jena, Oberkochen and Minsk in Belarus - a flexible center of excellence for single components and for complex assemblies and modules. The internationally aligned sourcing and partner network provides support over the entire value-add process. With its innovational capability, Carl Zeiss Jena GmbH is synonymous with transforming technological challenges into benefit-oriented solutions. Committed employees, ultra-modern technologies and a highly productive engineering capability are at disposal.

About Heidelberg Instruments GmbH:  With an installation base in over 30 countries, Heidelberg Instruments is a world leader in production of high precision maskless lithography systems. These systems are used for direct writing and photomask production by some of the most prestigious universities and industry leaders in the areas of MEMS, BioMEMS, Nano Technology, ASICS, TFT, Plasma Displays, Micro optics, and many other related applications.

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