There are many applications for implementation of electronic systems on non-planar surfaces such as imaging sensors, artificial vision, and integrated micro-optics. The standard photo lithography has many limitations and can not be used for patterning on non planar surfaces.
To realize lithographic processing of non-planar substrates like lenses, Heidelberg Instruments, in cooperation with the Fraunhofer Institute for Applied Optics and Precision Engineering (IOF), has developed a maskless lithography system capable of writing on planar and free form substrates such as concave and convex surfaces. This tool offers gray scale capabilities and can write structures down to 1 µm, making it possible to create complex and efficient micro-optical components and hybrids, combining refractive and diffractive elements.
Watch the following videos to have a better look at our Freeform Systems. Please also refer to our publications section for a number of links and publications related to this system.