Deep UV Lithography Systems

The laser sources in our standard systems range from 355 nm to 532 nm, making it possible to expose all the standard UV photo resists. However, for special applications resists sensitive at even shorter wavelengths are required. At the same time it is possible to create even smaller features because of the smaller wavelength. That is why we developed and installed deep UV lithography systems with a 244 nm laser source, which can expose these resists and write isolated structures down to 200 nm and lines and spaces with a period of 500 nm. Other DUV light sources are available on demand.