Direct Write Systems

The capabilities and flexibility of these systems make them the perfect lithographic tools for the production of photomasks as well as for direct exposures of wafers and other substrates. They are used for various applications like MEMS, BioMEMS, Micro Optics, ASICs, Micro Fluidics, Sensors, CGHs, and all other applications that require microstructures.

µPG 101 - Tabletop Micro Pattern Generator

µPG101

The µPG 101 is a flexible and intuitive to use lithography tool that will accelerate your research and make an easy first contact with Maskless Lithography.

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DWL 66+ - The Ultimate R&D Laser Lithography Tool

<span>DWL66</span><span><sup>+</sup></span> The new DWL 66+ laser lithography system is an economical, high resolution pattern generator for low volume mask making and direct writing. 

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DWL 2000 / DWL 4000 - Direct Write Lithography Systems

DWL2000 The DWL 2000 laser lithography system is a fast and flexible, high resolution pattern generator for mask making and direct writing. In addition to 2D patterns, the state of the art technology of the system can also create complex 3D structures in thick photoresist with a single pass.

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VPG 200 / VPG 400 - Small Area High Volume Pattern Generators

files/heidelberg/images/New product pictures/Thumbs/HIMT_VPG400_Highres.jpg The VPG 200 and VPG 400 laser lithography systems are economical, high resolution pattern generators for high volume mask making and direct writing.

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VPG 800 / VPG 1100 / VPG 1400 - Large Area High Volume Pattern Generators

VPG1400 The VPG 800/1100/1400 line of laser lithography systems is an cost effective solution for the fabrication of high resolution photomasks up to 1400 mm x 1400 mm.

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